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The State Administration for Market Regulation (SAMR) has endorsed the establishment of a groundbreaking new 2D linear reference device, bridging a significant gap in China's measurement capabilities for 2D linear standards within the realms of optical precision measurement equipment and high-precision photomask manufacturing. Boasting a measurement range of 320mm x 320mm and an exceptional measurement uncertainty of 28 nanometers, this device has attained an internationally acclaimed level of sophistication. It offers traceability for 2D dimensions, positions, and shapes, effectively addressing the measurement challenges posed by sub-micron and nano-scale photomasks. Furthermore, it provides independently controllable technical support, empowering the high-end manufacturing sector with unparalleled precision and reliability.
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