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Hefei Xinji Micro-Electronics Equipment Co., Ltd. Publishes Patent for "Exposure Assembly and Lithography Equipment Comprising the Same"
2025-01-14
Hefei Xinji Micro-Electronics Equipment Co., Ltd. has successfully published a patent for its innovative "Exposure Assembly and Lithography Equipment Comprising the Same," bearing the application publication number CN119126500A and dated October 13, 2024. This groundbreaking patent incorporates a beam splitter within the exposure assembly, which effectively reflects and decomposes light. This design facilitates real-time monitoring and adjustment of exposure performance, ultimately enhancing both the exposure effect and efficiency.
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