Shanghai AI Lab’s Joint Team Tackles Stability Challenges in Core Chip Material Photoresist Production
7 hour ago / Read about 0 minute
Author:小编   

The Shanghai AI Laboratory, working in tandem with Xiamen University, Suzhou National Laboratory, and other key partners, has pioneered a closed-loop research and development framework. This innovative system integrates AI-driven decision-making with automated synthesis, leveraging the powerful ‘Intern’ scientific large model and platform. Through this approach, the team has successfully engineered a KrF photoresist resin distinguished by its high purity, exceptional consistency, and superior efficiency.

This breakthrough marks a significant milestone, as it eliminates China’s reliance on imported materials for the stable production of high-end photoresist resins. Moreover, it establishes a new, standardized, and rapidly iterable pathway for advancements in the chip material sector. Presently, the platform has facilitated multiple rounds of automated synthesis and verification, significantly enhancing batch-to-batch consistency. Xiamen Hengkun has successfully adapted the resin, with key industrial metrics aligning with expectations, and is now poised to initiate client-side validation.

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