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ASML has recently announced that the development of its next-generation Twinscan NXE EUV lithography machine is advancing seamlessly. The machine's light source power is set to undergo a significant 50% enhancement, reaching an impressive 1000W. Concurrently, its production efficiency will experience a commendable 20% uplift, enabling it to process up to 330 wafers per hour. This groundbreaking innovation is anticipated to make its debut by 2030 or beyond. ASML exudes a sense of pride and unwavering confidence in this milestone, revealing that they have already charted a technical course towards a 1500W light source. Furthermore, they assert that, theoretically, there are no insurmountable barriers to achieving a remarkable 2000W light source.
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