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ASML Plans to Increase EUV Light Source Power to 1000W, Boosting Wafer Output per Hour by 50% by 2030
13 hour ago /
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Author：小编
ASML's Chief Technology Expert, Michael Purvis, revealed that his research team has successfully increased the light source power of extreme ultraviolet (EUV) lithography machines from 600 watts to 1000 watts. This breakthrough is not a short-term laboratory demonstration but a complete system capable of stable operation that meets the stringent requirements of actual customer production environments. According to ASML's calculations, after increasing the light source power to 1000 watts, the EUV lithography machine's wafer processing capacity per hour can increase from 220 wafers to 330 wafers by 2030, representing a 50% increase, while the manufacturing cost per wafer remains largely unchanged.
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