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Chinese Research Team Achieves New Breakthrough in Two-Dimensional Semiconductor Field
2 week ago /
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Author：小编
As silicon-based chips are inching closer to their physical performance boundaries, researchers across the globe are vigorously seeking alternative materials. Among these, two-dimensional semiconductor molybdenum disulfide has emerged as a focal point of interest. On January 30, 2026, a joint research team from Nanjing University, featuring Wang Xinran and Li Taotao, in collaboration with Wang Jinlan's team from Southeast University, unveiled a groundbreaking paper in the esteemed journal Science. They announced the successful creation of an 'oxygen-assisted metal-organic chemical vapor deposition technique,' which effectively surmounts the technical hurdles hindering the large-scale production of extensive molybdenum disulfide films.
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