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Intel Installs First Second-Generation High-NA EUV, Paving the Way for 14A Process
2025-12-18 /
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Author：小编
Recently, Intel announced that it has installed ASML's latest TWINSCAN EXE:5200B lithography system. This system is the world's first and currently the most advanced second-generation High-NA EUV lithography system, and will be applied to Intel's 14A node process. Previously, Intel received the first High-NA EUV model EXE:5000 at the end of 2023 and completed early technology R&D and talent preparation at its Fab D1X factory in Oregon. The newly installed EXE:5200B has seen improvements in both productivity and precision.
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