The research team, headed by Professor Peng Hailin from the College of Chemistry and Molecular Engineering at Peking University, along with their collaborators, has made a groundbreaking move. For the first time, they've utilized cryo - electron tomography to unveil the microscopic three - dimensional structures, interfacial distributions, and entanglement behaviors of photoresist molecules. This exploration takes place in a liquid - phase environment under in - situ conditions.

Drawing on these discoveries, they've formulated an industrialization plan aimed at minimizing photolithography defects. Their relevant research findings have been published in the esteemed journal Nature Communications. In the photolithography process, the 'development' stage holds immense significance. However, for a long time, the microscopic behaviors of photoresists in developer solutions have been shrouded in mystery. This lack of clarity has been a hindrance, impacting the yield of advanced processes.

This innovative technology has successfully pieced together microscopic three - dimensional images with a resolution that surpasses 5 nanometers. In doing so, it has overcome the limitations of traditional techniques. Professor Peng Hailin emphasized that this technology is set to play a pivotal role in bolstering defect control and enhancing the yield in the crucial processes of advanced manufacturing.