On October 15, 2025, according to the Korea Economic Daily, Samsung Electronics plans to invest approximately 1.1 trillion won (approximately 5.492 billion yuan) to introduce two of the latest High-NA dual-stage extreme ultraviolet (EUV) lithography machines, aiming to drive mass production of next-generation semiconductor chips. Previously, Samsung had only introduced one High-NA EUV machine for research and development purposes at its Gyeonggi-do campus. The machines introduced this time will be used for product mass production for the first time. Samsung plans to introduce one machine within the year and another in the first half of next year. The model of the lithography machines introduced this time is Twin Scan EXE:5200B, which is the second High-NA extreme ultraviolet lithography system with a numerical aperture (NA) of 0.55 and an upgraded version of the TWINSCAN EXE:5000. This equipment significantly improves alignment accuracy and production efficiency and is regarded as an essential device for producing next-generation semiconductor chips and high-performance DRAM.