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Russia Releases Roadmap for EUV Lithography Machine: A Three-Step Approach to Achieve Sub-10nm Technology
1 day ago /
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Author：小编
The Institute of Microstructure Physics at the Russian Academy of Sciences (led by Dmitry Kuznetsov) has formulated a long-term plan for the development of domestically produced extreme ultraviolet (EUV) lithography equipment, which operates at a wavelength of 11.2 nanometers. This plan further supplements the information released by the institute in December last year. The new project is scheduled to commence in 2026, initially adopting 40nm manufacturing technology, and is expected to continue until 2037, ultimately achieving the integration of sub-10nm manufacturing processes.
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