Tsinghua University's Li Xinghui-Led Team Makes Significant Breakthrough in Cross-Scale Structural Hybrid Lithography Fabrication Technology
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Author:小编   

On September 16th, reports emerged indicating that as semiconductor manufacturing, precision optical processing, and large-scale optical systems continue to advance, nanoscale positioning technology has assumed a pivotal role in modern industry and scientific research. Grating interferometry, renowned for its high resolution, multi-degree-of-freedom measurement capabilities, and compact design, has found widespread application in high-precision displacement measurement. Nevertheless, despite the high accuracy offered by traditional incremental gratings, their lack of absolute position markers poses a limitation, particularly in terms of stability during dynamic operations and long-term measurements.